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      • Title:Two-inch Six-wafer W620 System
      • Introduction:

        Specification:

        1. Substrate: 2-inch 6-wafer

        2. Temperature Control Range: 300℃-1300℃

        3. Max Growth Rate: >3um/hour

        4. Reaction Chamber’s Pressure Control Range: 20-900Torr; continuously adjustable; 

            Control Accuracy: 1Torr (200-900Torr); 0.2Torr (20-200Torr). 

        5. Air Tightness of the System: Leak Rate of the Piping System < 1×10-9PaL/S

        6. Uniformity and Repeatability of the Epitaxial Film: Better than ±5%

        7. Gas Delivery Loops (can be customized to meet users’ needs):  

        4 Carrier Gases
        H2, N2, NH3, SiH4
        6 MO Sources
        TEG, TEA, TMA, Cp2Mg, TMG, TMin

        8. Dimension (L×W×H): 4800×800×2200mm (not including the power supply of the RF device).


       

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  • keywords: disinfection light source; UV disinfection; UV light source